Atomic layer deposition (ALD) is a process used to deposit a wide variety of thin film materials from the vapor phase of matter. The system involves alternating pulses of gaseous precursors that ...

Atomic layer etching (ALE) is the reverse of atomic layer deposition (ALD). ALE can be achieved using sequential, self-limiting thermal reactions. We have recently demonstrated Al 2 O 3 ALE [1-3] and ...

"If we compare the amount of catalyst material ... ZrOx clusters on MgO for CO2 hydrogenation using liquid-phase atomic layer deposition, Nature Catalysis (2024). DOI: 10.1038/s41929-024-01236 ...

Researchers at the University at Albany’s College of Nanotechnology, Science, and Engineering now have access to a new fabrication system capable of manipulating microchip designs at the atomic level.

Atomic layer deposition (ALD) is a thin film deposition technique that is based on the sequential use of a gas phase chemical process. The majority of ALD reactions use two chemicals referred to as ...