CD-SEM plays a crucial role in lithography process control, particularly in advanced patterning techniques such as extreme ultraviolet (EUV) lithography and directed self-assembly (DSA). In EUV ...
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From toilets to chips — Toto's electrostatic chucks are becoming a crucial element of modern fabsEUV lithography operates at very short 13.5nm wavelengths ... and improve overlay and critical dimension (CD) control. It takes over 4,000 steps to process a wafer and make a chip.
Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...
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