Sokudo, a Japanese manufacturer of equipment for coating and developing photoresists on wafers, has released what it claims is the world's first dual-track system for parallel simultaneous processing.

Instead of spin coating, the resist is deposited on the wafers in the CVD system, which reduces resist waste in the fab. Dry resist technology is especially noteworthy. If it works, the technology ...

The first step is to coat a wafer with a layer of e-beam resist. [Zach] used PMMA, commonly known as acrylic plastic, and applied it using spin coating after dissolving it in anisole. He then ...

It utilizes interferometric sensors for extremely accurate, spatially resolved coating thickness assessments ... of the homogeneity of the photoresist on wafers up to 300 mm.

It is employed for depositing photoresists ... onto silicon wafers or other substrates. The precise thickness control and uniformity achieved by spin coating are crucial for the reliable performance ...

a fully automated wafer metrology tool, can be used for an extensive range of applications at various 3D packaging process steps, including the measurement of photoresist coatings and structuring, ...

SOI and wafer backgrinding for semiconductor production LCD with cell gaps, polyimide and ITO Photoresist, silicon membranes and dielectric stacks are examples of MEMS Hardness coatings, ...

wafer backgrinding LCD, including cell gaps, polyimide, ITO MEMS, including photoresist, silicon membranes, dielectric stacks Optical coatings, including hardness coatings, anti-reflection, and ...